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Semi-Automatic Developing Cleaning Machine

Semi-Automatic Developing Cleaning Machine

ItemSpecification
Applicable Workpiece4~8 inch wafer cleaning
Batch Capacity25 pcs/batch for 8 inch
Process FlowQDR ← Developing → QDR ← Developing → QDR
Process Tank FunctionsCirculation filtration + Heating/Cooling + Up-down oscillation + Wafer rolling
Main MaterialsMetal frame + PVC/PPW shell plate, tank made of PPN/PVDF material
Transfer MethodManual transfer
Cycle TimeAdjustable from 5~15 minutes according to process requirements

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